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Role of the dispersion force in modeling the interfacial properties of molecule-metal interfaces: adsorption of thiophene on copper surfaces

机译:分散力在模拟界面性质中的作用   分子 - 金属界面:噻吩在铜表面上的吸附

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摘要

We present density functional theory calculations of the geometry, adsorptionenergy and electronic structure of thiophene adsorbed on Cu(111), Cu(110) andCu(100) surfaces. Our calculations employ dispersion corrections andself-consistent van der Waals density functionals (vdW-DFs). In terms of speedand accuracy, we find that the dispersion-energy-corrected RevisedPerdue-Burke-Enzerhof (RPBE) functional is the "best balanced" method forpredicting structural and energetic properties, while vdW-DF is also highlyaccurate if a proper exchange functional is used. Discrepancies between theoryand experiment in molecular geometry can be solved by considering x-raygenerated core-holes. However, the discrepancy concerning the adsorption sitefor thiophene/Cu(100) remains unresolved and requires both further experimentsand deeper theoretical analysis. For all the interfaces, the PBE functionalreveals a covalent bonding picture which the inclusion of dispersivecontributions does not change to a vdW one. Our results provide a comprehensiveunderstanding of the role of dispersive forces in modelling molecule-metalinterfaces.
机译:我们提出了噻吩在Cu(111),Cu(110)和Cu(100)表面上吸附的几何结构,吸附能和电子结构的密度泛函理论计算。我们的计算使用色散校正和自洽范德华密度函数(vdW-DFs)。在速度和准确性方面,我们发现色散能量校正的RevisedPerdue-Burke-Enzerhof(RPBE)函数是预测结构和能量特性的“最佳平衡”方法,而vdW-DF如果是合适的交换函数,则也非常准确。用过的。可以通过考虑x射线生成的核孔来解决分子几何学中理论与实验之间的差异。但是,关于噻吩/ Cu(100)的吸附位的差异仍未解决,需要进一步的实验和更深入的理论分析。对于所有接口,PBE功能揭示了一个共价键图片,其中的分散贡献不会更改为vdW。我们的结果提供了对分子-金属界面建模中分散力作用的全面理解。

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